As the gas pressure in discharge chamber varies within the operation range the percentages of metal and halogen ions in total beam current vary with it. 那就是,放电室内的气压在工作范围内变化时,离子束中金属离子和卤素离子的含量也都随之改变。
The design of the gun is commonly defined by perveance, beam current, waist radius, waist position and cathode current density. 它的设计主要有导流系数、流、腰半径、腰位置以及阴极电流密度。
If a majority of the sample is polymer, low beam energy and beam current, and drift compensation are required to obtain meaningful results. 如果样品大部分是聚合物,需要降低电子束能量和探针电流,需要漂移补偿获得有意义的结果。
In this paper, the ICT-based DC beam current measurement, equivalent sampling method and testing results at Shanghai Synchrotron Radiation Facility ( SSRF) is described. 本文主要介绍了基于ICT探头的甲均流强测量系统、测量算法和实验室测试结果。
It was found that the thickness of the melted surface layer varies with the electron beam current and numbers of pulses, but the voltage has a minimal effect. 脉冲电流和脉冲次数对表面熔凝层厚度具有较大影响,而加速电压的影响不大。
Both the code and the envelope equations take account of the self? electromagnetic field and applied electromagnetic field of the beam current. 程序和包络方程都考虑了束流的自生电磁场及外加电磁场。
Evaporation loss rate reduces when accelerating voltage, beam current and welding speed increase. 但加速电压、束流、焊接速度的增加反而使烧损率降低。
The preparation of TiO_2 film assisted with ion beam current have preferable photocatalysis and higher light transmissivity. 离子束辅助沉积制备的纯TiO2薄膜的光催化性能较好,且光透过率高,吸收性能好。
The influences of beam current, signal current, equivalent temperature of beam, target capacitor and velocity of scanning on the self-sharpening effect have been analyzed. 分析了束电流、信号电流、束等效温度、靶面电容、扫描速度等因素在自变尖效应中所起的作用。
The characteristics of the intense pulsed ion beams generated with a 200 kV pinch reflex ion diode are investigated through the measurement of the ion beam current density distribution and the microstructure analyses of Cu foil bombarded by the ion beam. 通过对离子束流密度分布的测量和对被离子束轰击的铜箔不同半径处表面微观形貌的分析,研究了200kV箍缩反射离子二极管产生的离子束特性。
Ion beam induced charge microscopy was studied in nuclear microprobe using low beam current technology, the electrical property of GaAs semiconductor material was also studied. 使用低束流技术,在高分辨率扫描质子微探针装置上开展了离子束感生电荷显微术,并研究了半导体材料GaAs的电子学性能。
Factors influencing emission stability and beam current uniformity are discussed. 按顺序进行了阴耐压调试、发射电流调试和靶面束流均匀性调试,本章重点分析了影响发射稳定性和束流均匀性的因素。
The extracted beam current depends on operating parameter of source, extraction voltage and cathode material. 引出束流大小与源的工作参数、引出结构和电压以及阴极材料有关。
The selection for acceleration of voltage and beam current has been studied in case of observation of powder specimen by SEM. 研究了用扫描电镜观察粉末试样时加速电压和束流的选择。
The gain and the bandwidth are derived, the effects of electron beam current, input power and guiding magnetic field is numerically calculated. 对三种提高增益带宽的方法进行了理论分析和数值模拟。分析了电子束束流、输入射频功率和速度比对微波输出的影响。
A ns pulse beam device is installed at pulse beam current piping. 在脉冲束流管道上安装有强流毫微秒脉冲化聚束装置。
Effect of Faraday cup impedance on electron beam current of diode 法拉第筒阻抗对二极管电子束流性能的影响
The transmissivity of the films will increase to a critical value with ion beam current density. 薄膜透射率极值随束流密度增大有临界值。
The influences on the beam current are observed by adjusting arc voltage and gas injection at different cases. 在多种参数下,通过调节弧压、进气量等观察了其对弧流的影响。
Fusion penetration increases when accelerating voltage, beam current increase and welding speed minishes; 熔深随着加速电压和束流的增大而增大,随着焊接速度增大而减小。
The technical specifications such as electron beam current and minimum spot diameter are gotten in experiments and applications. 通过调试和使用,电子束流、最小电子束斑直径等主要设计指标均达要求。
The pulsed cathodic arc metal plasma source was optimized by studying the influence of two factors, including the bias voltage of the magnetic duct and the current of the magnetic coils, on the ion beam current. 对脉冲阴极弧金属等离子体源的工作参数进行了测量,研究了离子流与磁导管偏压以及磁场电流与离子流之间的关系,确定了其最佳工作参数。
The distribution of the extraction apertures is made to compensate the Gaussan of the ion beam current density. 使引出孔的分布补偿束电流密度的高斯分布。
In the process of both large detuning injection and tuning injection, the variation of tuning angle and visual detuning angle with beam current intensity was analyzed. 通过模拟计算分析了大失谐注入和调谐注入过程中调谐角和视在失谐角与注入流强的关系。
Effects of electron beam brazing parameters including beam current, heating time, focus current and scanning amplitude on the quality of brazing joints are discussed. 研究了电子束束流、加热时间、聚焦电流和扫描幅值等电子束钎焊工艺参数对钎焊接头质量的影响规律。
With the mathematic model of tracking beam current by velocity, real-time tracking can be obtained; 通过建立速度跟踪束流的数学模型,较好地解决了速度跟踪束流的实时性问题;
The RF field is determined by cavity geometry and AC electron beam current. 高频场是由腔体几何尺寸和交变电子注电流确定的。
In the corresponding parameters, the influence of the external magnetic field, the voltage of electron beam, the electronic beam current on the output power and efficiency have been shown, and the operating frequency under different the parameters is analyzed in detail. 在相应参数下,得出了外加磁场、电子注电压、电子束电流对注波互作用的输出功率和效率的影响,并对各参数下的工作频率进行了分析研究。
Beam current is one of the key factors which affect the electron beam annealing. 束流是影响电子束退火效果的关键因素之一。